Germanium Based Technologies Book
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Germanium Based Technologies


  • Author : Cor Claeys
  • Publisher : Elsevier
  • Release Date : 2011-07-28
  • Genre: Science
  • Pages : 480
  • ISBN 10 : 008047490X

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Germanium Based Technologies Excerpt :

Germanium is a semiconductor material that formed the basis for the development of transistor technology. Although the breakthrough of planar technology and integrated circuits put silicon in the foreground, in recent years there has been a renewed interest in germanium, which has been triggered by its strong potential for deep submicron (sub 45 nm) technologies. Germanium-Based technologies: From Materials to Devices is the first book to provide a broad, in-depth coverage of the field, including recent advances in Ge-technology and the fundamentals in material science, device physics and semiconductor processing. The contributing authors are international experts with a world-wide recognition and involved in the leading research in the field. The book also covers applications and the use of Ge for optoelectronics, detectors and solar cells. An ideal reference work for students and scientists working in the field of physics of semiconductor devices and materials, as well as for engineers in research centres and industry. Both the newcomer and the expert should benefit from this unique book. State-of-the-art information available for the first time as an all-in-source Extensive reference list making it an indispensable reference book Broad coverage from fundamental aspects up to industrial applications

Metal Impurities in Silicon  and Germanium Based Technologies Book

Metal Impurities in Silicon and Germanium Based Technologies


  • Author : Cor Claeys
  • Publisher : Springer
  • Release Date : 2018-08-13
  • Genre: Technology & Engineering
  • Pages : 438
  • ISBN 10 : 9783319939254

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Metal Impurities in Silicon and Germanium Based Technologies Excerpt :

This book provides a unique review of various aspects of metallic contamination in Si and Ge-based semiconductors. It discusses all of the important metals including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on electrical devices’ performance. Several control and possible gettering approaches are addressed. The book offers a valuable reference guide for all researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. Adopting an interdisciplinary approach, it combines perspectives from e.g. material science, defect engineering, device processing, defect and device characterization, and device physics and engineering.

The Source Drain Engineering of Nanoscale Germanium based MOS Devices Book

The Source Drain Engineering of Nanoscale Germanium based MOS Devices


  • Author : Zhiqiang Li
  • Publisher : Springer
  • Release Date : 2016-03-24
  • Genre: Technology & Engineering
  • Pages : 59
  • ISBN 10 : 9783662496831

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The Source Drain Engineering of Nanoscale Germanium based MOS Devices Excerpt :

This book mainly focuses on reducing the high parasitic resistance in the source/drain of germanium nMOSFET. With adopting of the Implantation After Germanide (IAG) technique, P and Sb co-implantation technique and Multiple Implantation and Multiple Annealing (MIMA) technique, the electron Schottky barrier height of NiGe/Ge contact is modulated to 0.1eV, the thermal stability of NiGe is improved to 600°C and the contact resistivity of metal/n-Ge contact is drastically reduced to 3.8×10−7Ω•cm2, respectively. Besides, a reduced source/drain parasitic resistance is demonstrated in the fabricated Ge nMOSFET. Readers will find useful information about the source/drain engineering technique for high-performance CMOS devices at future technology node.

Metal Impurities in Silicon  and Germanium based Technologies Book

Metal Impurities in Silicon and Germanium based Technologies


  • Author : Cor L. Claeys
  • Publisher : Unknown
  • Release Date : 2018
  • Genre: Metals
  • Pages : null
  • ISBN 10 : 3319939262

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Metal Impurities in Silicon and Germanium based Technologies Excerpt :

This book gives a unique review of different aspects of metallic contaminations in Si and Ge-based semiconductors. All important metals are discussed including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on the electrical device performance. Several control and possible gettering approaches are addressed. The book is a reference for researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. It has an interdisciplinary nature by combining different disciplines such as material science, defect engineering, device processing, defect and device characterization and device physics and engineering.

Advanced Material and Device Applications with Germanium Book

Advanced Material and Device Applications with Germanium


  • Author : Sanghyun Lee
  • Publisher : BoD – Books on Demand
  • Release Date : 2018-10-03
  • Genre: Science
  • Pages : 100
  • ISBN 10 : 9781789840315

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Advanced Material and Device Applications with Germanium Excerpt :

Germanium is an elemental semiconductor, which played an important role in the birth of the semiconductor but soon was replaced with silicon. However, germanium is poised to make a remarkable comeback in the semiconductor industry. With this increasing attention, this book describes the fundamental aspects of germanium and its applications. The contributing authors are experts in their field with great in-depth knowledge. The authors strongly feel that this contribution might be of interest to readers and help to expand the scope of their knowledge.

Silicon  Germanium  and Their Alloys Book

Silicon Germanium and Their Alloys


  • Author : Gudrun Kissinger
  • Publisher : CRC Press
  • Release Date : 2014-12-09
  • Genre: Science
  • Pages : 436
  • ISBN 10 : 9781466586642

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Silicon Germanium and Their Alloys Excerpt :

Despite the vast knowledge accumulated on silicon, germanium, and their alloys, these materials still demand research, eminently in view of the improvement of knowledge on silicon–germanium alloys and the potentialities of silicon as a substrate for high-efficiency solar cells and for compound semiconductors and the ongoing development of nanodevices based on nanowires and nanodots. Silicon, Germanium, and Their Alloys: Growth, Defects, Impurities, and Nanocrystals covers the entire spectrum of R&D activities in silicon, germanium, and their alloys, presenting the latest achievements in the field of crystal growth, point defects, extended defects, and impurities of silicon and germanium nanocrystals. World-recognized experts are the authors of the book’s chapters, which span bulk, thin film, and nanostructured materials growth and characterization problems, theoretical modeling, crystal defects, diffusion, and issues of key applicative value, including chemical etching as a defect delineation technique, the spectroscopic analysis of impurities, and the use of devices as tools for the measurement of materials quality.

Epitaxial Growth of Nitrides on Germanium Book

Epitaxial Growth of Nitrides on Germanium


  • Author : Ruben Lieten
  • Publisher : ASP / VUBPRESS / UPA
  • Release Date : 2009-09-01
  • Genre: Technology & Engineering
  • Pages : 162
  • ISBN 10 : 9789054874850

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Epitaxial Growth of Nitrides on Germanium Excerpt :

A comprehensive guide to the formation of epitaxial III-Nitrides and epitaxial Ge3N4 on germanium substrates--and solid phase epitaxy of germanium on silicon substrates--this work presents a simple but effective method for growing epitaxial III-Nitride layers on crystalline germanium surfaces. Beside epitaxial III-Nitride growth, a method is introduced to obtain epitaxial Ge3N4 on germanium. Finally a novel method to produce high-quality germanium layers on silicon is introduced, allowing interactions between germanium devices and silicon technology. This study provides researchers with a detailed look at the formation of crystalline nitrides on germanium, germanium on silicon, Schottky contacts on germanium, and electrochemical measurements.

Applications of Silicon Germanium Heterostructure Devices Book

Applications of Silicon Germanium Heterostructure Devices


  • Author : C.K Maiti
  • Publisher : CRC Press
  • Release Date : 2001-07-20
  • Genre: Science
  • Pages : 402
  • ISBN 10 : 9781420034691

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Applications of Silicon Germanium Heterostructure Devices Excerpt :

The first book to deal with the design and optimization of transistors made from strained layers, Applications of Silicon-Germanium Heterostructure Devices combines three distinct topics-technology, device design and simulation, and applications-in a comprehensive way. Important aspects of the book include key technology issues for the growth of st

Millimeter Wave Receiver Concepts for 77 GHz Automotive Radar in Silicon Germanium Technology Book

Millimeter Wave Receiver Concepts for 77 GHz Automotive Radar in Silicon Germanium Technology


  • Author : Dietmar Kissinger
  • Publisher : Springer Science & Business Media
  • Release Date : 2012-03-09
  • Genre: Technology & Engineering
  • Pages : 111
  • ISBN 10 : 9781461422891

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Millimeter Wave Receiver Concepts for 77 GHz Automotive Radar in Silicon Germanium Technology Excerpt :

The book presents the analysis and design of integrated automotive radar receivers in Silicon-Germanium technology, for use in complex multi-channel radar transceiver front-ends in the 77GHz frequency band. The main emphasis of the work is the realization of high-linearity and low-power modular receiver channels as well as the investigation of millimeter-wave integrated test concepts for the receiver front-end.

Silicon Technologies Book

Silicon Technologies


  • Author : Annie Baudrant
  • Publisher : John Wiley & Sons
  • Release Date : 2013-05-10
  • Genre: Technology & Engineering
  • Pages : 368
  • ISBN 10 : 9781118601143

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Silicon Technologies Excerpt :

The main purpose of this book is to remind new engineers in siliconfoundry, the fundamental physical and chemical rules in major Frontend treatments: oxidation, epitaxy, ion implantation and impuritiesdiffusion.

Physical Chemistry of Semiconductor Materials and Processes Book

Physical Chemistry of Semiconductor Materials and Processes


  • Author : Anonim
  • Publisher : John Wiley & Sons
  • Release Date : 2015-10-12
  • Genre: Science
  • Pages : 415
  • ISBN 10 : 9781118514573

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Physical Chemistry of Semiconductor Materials and Processes Excerpt :

The development of solid state devices began a little more than a century ago, with the discovery of the electrical conductivity of ionic solids. Today, solid state technologies form the background of the society in which we live. The aim of this book is threefold: to present the background physical chemistry on which the technology of semiconductor devices is based; secondly, to describe specific issues such as the role of defects on the properties of solids, and the crucial influence of surface properties; and ultimately, to look at the physics and chemistry of semiconductor growth processes, both at the bulk and thin-film level, together with some issues relating to the properties of nano-devices. Divided into five chapters, it covers: Thermodynamics of solids, including phases and their properties and structural order Point defects in semiconductors Extended defects in semiconductors and their interactions with point defects and impurities Growth of semiconductor materials Physical chemistry of semiconductor materials processing With applications across all solid state technologies,the book is useful for advanced students and researchers in materials science, physics, chemistry, electrical and electronic engineering. It is also useful for those in the semiconductor industry.

Silicon Germanium Strained Layers and Heterostructures Book

Silicon Germanium Strained Layers and Heterostructures


  • Author : M. Willander
  • Publisher : Elsevier
  • Release Date : 2003-10-02
  • Genre: Technology & Engineering
  • Pages : 322
  • ISBN 10 : 9780080541020

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Silicon Germanium Strained Layers and Heterostructures Excerpt :

The study of Silicone Germanium strained layers has broad implications for material scientists and engineers, in particular those working on the design and modelling of semi-conductor devices. Since the publication of the original volume in 1994, there has been a steady flow of new ideas, new understanding, new Silicon-Germanium (SiGe) structures and new devices with enhanced performance. Written for both students and senior researchers, the 2nd edition of Silicon-Germanium Strained Layers and Heterostructures provides an essential up-date of this important topic, describing in particular the recent developments in technology and modelling. * Fully-revised and updated 2nd edition incorporating important recent breakthroughs and a complete literature review * The extensive bibliography of over 400 papers provides a comprehensive and coherent overview of the subject * Appropriate for students and senior researchers

Silicon Germanium Materials and Devices   A Market and Technology Overview to 2006 Book

Silicon Germanium Materials and Devices A Market and Technology Overview to 2006


  • Author : R. Szweda
  • Publisher : Elsevier
  • Release Date : 2002-11-26
  • Genre: Technology & Engineering
  • Pages : 418
  • ISBN 10 : 0080541216

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Silicon Germanium Materials and Devices A Market and Technology Overview to 2006 Excerpt :

The first edition of Silicon Germanium Materials & Devices - A Market & Technology Overview to 2006 examines the development of the silicon germanium business over a six-year period 2001 to 2006. It analyses the trends in markets, technologies and industry structure and profiles all the major players. It is specifically aimed at users and manufacturers of substrates, epiwafers, equipment and devices. The analysis includes a competitive assessment of the market of silicon germanium vs. gallium arsenide, indium phosphide vs. other forms of silicon. Silicon Germanium Materials & Devices - A Market & Technology Overview to 2006 is designed to assist with business plans, R&D and manufacturing strategies. It will be an indispensable aid for managers responsible for business development, technology assessment and market research. The report examines the rapid development of silicon germanium from an R&D curiosity to production status. An extensive treatment from materials through processes to devices and applications it encapsulates the entire silicon germanium business of today and assesses future directions. For a PDF version of the report please call Tina Enright on +44 (0) 1865 843008 for price details.

Silicon Germanium Book

Silicon Germanium


  • Author : Raminderpal Singh
  • Publisher : John Wiley & Sons
  • Release Date : 2004-03-15
  • Genre: Technology & Engineering
  • Pages : 368
  • ISBN 10 : 9780471660910

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Silicon Germanium Excerpt :

"An excellent introduction to the SiGe BiCMOS technology, from the underlying device physics to current applications." -Ron Wilson, EETimes "SiGe technology has demonstrated the ability to provide excellent high-performance characteristics with very low noise, at high power gain, and with excellent linearity. This book is a comprehensive review of the technology and of the design methods that go with it." -Alberto Sangiovanni-Vincentelli Professor, University of California, Berkeley Cofounder, Chief Technology Officer, Member of Board Cadence Design Systems Inc. Filled with in-depth insights and expert advice, Silicon Germanium covers all the key aspects of this technology and its applications. Beginning with a brief introduction to and historical perspective of IBM's SiGe technology, this comprehensive guide quickly moves on to: * Detail many of IBM's SiGe technology development programs * Explore IBM's approach to device modeling and characterization-including predictive TCAD modeling * Discuss IBM's design automation and signal integrity knowledge and implementation methodologies * Illustrate design applications in a variety of IBM's SiGe technologies * Highlight details of highly integrated SiGe BiCMOS system-on-chip (SOC) design Written for RF/analog and mixed-signal designers, CAD designers, semiconductor students, and foundry process engineers worldwide, Silicon Germanium provides detailed insight into the modeling and design automation requirements for leading-edge RF/analog and mixed-signal products, and illustrates in-depth applications that can be implemented using IBM's advanced SiGe process technologies and design kits. "This volume provides an excellent introduction to the SiGe BiCMOS technology, from the underlying device physics to current applications. But just as important is the window the text provides into the infrastructure-the process development, device modeling, and tool development." -Ron Wilson Silicon Engineering Editor, EETimes "This boo