High Power Impulse Magnetron Sputtering Book

High Power Impulse Magnetron Sputtering


  • Author : Daniel Lundin
  • Publisher : Unknown
  • Release Date : 2019-09-13
  • Genre: Technology & Engineering
  • Pages : 398
  • ISBN 10 : 9780128124543

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High Power Impulse Magnetron Sputtering Excerpt :

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

High Power Impulse Magnetron Sputtering Book
Score: 5
From 1 Ratings

High Power Impulse Magnetron Sputtering


  • Author : Daniel Lundin
  • Publisher : Elsevier
  • Release Date : 2019-08-28
  • Genre: Technology & Engineering
  • Pages : 398
  • ISBN 10 : 9780128124550

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High Power Impulse Magnetron Sputtering Excerpt :

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Ionized Physical Vapor Deposition Book

Ionized Physical Vapor Deposition


  • Author : Anonim
  • Publisher : Academic Press
  • Release Date : 1999-10-14
  • Genre: Technology & Engineering
  • Pages : 255
  • ISBN 10 : 9780080542935

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Ionized Physical Vapor Deposition Excerpt :

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *T

Cathodic Arcs Book

Cathodic Arcs


  • Author : André Anders
  • Publisher : Springer Science & Business Media
  • Release Date : 2009-07-30
  • Genre: Science
  • Pages : 544
  • ISBN 10 : 9780387791081

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Cathodic Arcs Excerpt :

Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.

The Foundations of Vacuum Coating Technology Book

The Foundations of Vacuum Coating Technology


  • Author : Donald M. Mattox
  • Publisher : William Andrew
  • Release Date : 2018-08-21
  • Genre: Technology & Engineering
  • Pages : 378
  • ISBN 10 : 9780128130858

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The Foundations of Vacuum Coating Technology Excerpt :

The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating

Handbook of Physical Vapor Deposition  PVD  Processing Book
Score: 5
From 1 Ratings

Handbook of Physical Vapor Deposition PVD Processing


  • Author : D. M. Mattox
  • Publisher : Cambridge University Press
  • Release Date : 2014-09-19
  • Genre: Technology & Engineering
  • Pages : 947
  • ISBN 10 : 9780080946580

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Handbook of Physical Vapor Deposition PVD Processing Excerpt :

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in

Reactive Sputter Deposition Book

Reactive Sputter Deposition


  • Author : Diederik Depla
  • Publisher : Springer
  • Release Date : 2010-11-25
  • Genre: Technology & Engineering
  • Pages : 572
  • ISBN 10 : 3642095364

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Reactive Sputter Deposition Excerpt :

In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Gas Phase Synthesis of Nanoparticles Book

Gas Phase Synthesis of Nanoparticles


  • Author : Yves Huttel
  • Publisher : John Wiley & Sons
  • Release Date : 2017-06-19
  • Genre: Technology & Engineering
  • Pages : 416
  • ISBN 10 : 9783527340606

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Gas Phase Synthesis of Nanoparticles Excerpt :

The first overview of this topic begins with some historical aspects and a survey of the principles of the gas aggregation method. The second part covers modifications of this method resulting in different specialized techniques, while the third discusses the post-growth treatment that can be applied to the nanoparticles. The whole is rounded off by a review of future perspectives and the challenges facing the scientific and industrial communities. An excellent resource for anyone working with the synthesis of nanoparticles, both in academia and industry.

Investigation of industrially suited processes for deposition of oxide thin films by high power impulse magnetron sputtering  Book

Investigation of industrially suited processes for deposition of oxide thin films by high power impulse magnetron sputtering


  • Author : Felipe de Campos Carreri
  • Publisher : BoD – Books on Demand
  • Release Date : 2022-09-07
  • Genre: Technology & Engineering
  • Pages : 220
  • ISBN 10 : 9783839612873

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Investigation of industrially suited processes for deposition of oxide thin films by high power impulse magnetron sputtering Excerpt :

The scope of this work is to investigate and to develop advanced HIPIMS processes for deposition of oxides, utilizing industrial-scale equipment and technology. Two classes of oxide materials were studied: insulating (aluminum oxide) and conducting oxides (indium-tin oxide and aluminum-doped zinc oxide). The electrical properties of the oxides have a significant influence on the process design, as the issues and approaches for deposition of insulating materials are fairly different from conducting materials. Different types of reactive process control were also investigated, utilizing optical emission spectroscopy to control the oxygen flow and lambda probes to control the discharge power. A non-reactive process was also studied for indium-tin oxide.

Encyclopedia of Plasma Technology   Two Volume Set Book

Encyclopedia of Plasma Technology Two Volume Set


  • Author : J. Leon Shohet
  • Publisher : CRC Press
  • Release Date : 2016-12-12
  • Genre: Technology & Engineering
  • Pages : 3082
  • ISBN 10 : 9781351204934

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Encyclopedia of Plasma Technology Two Volume Set Excerpt :

Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) e-reference@taylorandfrancis.com International: (Tel) +44 (0) 20 7017 6062; (E-mail) online.sales@tandf.co.uk

Protective Thin Coatings Technology Book

Protective Thin Coatings Technology


  • Author : Sam Zhang
  • Publisher : CRC Press
  • Release Date : 2021-08-09
  • Genre: Technology & Engineering
  • Pages : 513
  • ISBN 10 : 9781000408478

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Protective Thin Coatings Technology Excerpt :

Hard or protective coatings are widely used in conventional and modern industries and will continue to play a key role in future manufacturing, especially in the micro and nano areas. Protective Thin Coatings Technology highlights the developments and advances in the preparation, characterization, and applications of protective micro-/nanoscaled films and coatings. This book Covers technologies for sputtering of flexible hard nanocoatings, deposition of solid lubricating films, and multilayer transition metal nitrides Describes integrated nanomechanical characterization of hard coatings, corrosion and tribo-corrosion of hard coatings, and high entropy alloy films and coatings Investigates thin films and coatings for high-temperature applications, nanocomposite coatings on magnesium alloys, and the correlation between coating properties and industrial applications Features various aspects of hard coatings, covering advanced sputtering technologies, structural characterizations, and simulations, as well as applications This first volume in the two-volume set, Protective Thin Coatings and Functional Thin Films Technology, will benefit industry professionals and researchers working in areas related to semiconductors, optoelectronics, plasma technology, solid-state energy storages, and 5G, as well as advanced students studying electrical, mechanical, chemical, and material engineering.

Recent Advances in Technology Research and Education Book

Recent Advances in Technology Research and Education


  • Author : Dumitru Luca
  • Publisher : Springer
  • Release Date : 2017-09-08
  • Genre: Technology & Engineering
  • Pages : 352
  • ISBN 10 : 9783319674599

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Recent Advances in Technology Research and Education Excerpt :

This book presents selected contributions to the 16th International Conference on Global Research and Education Inter-Academia 2017 hosted by Alexandru Ioan Cuza University of Iași, Romania from 25 to 28 September 2017. It is the third volume in the series, following the editions from 2015 and 2016. Fundamental and applied research in natural sciences have led to crucial developments in the ongoing 4th global industrial revolution, in the course of which information technology has become deeply embedded in industrial management, research and innovation – and just as deeply in education and everyday life. Materials science and nanotechnology, plasma and solid state physics, photonics, electrical and electronic engineering, robotics and metrology, signal processing, e-learning, intelligent and soft computing have long since been central research priorities for the Inter-Academia Community (I-AC) – a body comprising 14 universities and research institutes from Japan and Central/East-European countries that agreed, in 2002, to coordinate their research and education programs so as to better address today’s challenges. The book is intended for use in academic, government, and industrial R&D departments as a reference tool in research and technology education. The 42 peer-reviewed papers were written by more than 119 leading scientists from 14 countries, most of them affiliated to the I-AC.

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods  Processes  Properties and Applications Book

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods Processes Properties and Applications


  • Author : Filipe Vaz
  • Publisher : Bentham Science Publishers
  • Release Date : 2013-06-21
  • Genre: Technology & Engineering
  • Pages : 363
  • ISBN 10 : 9781608051564

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Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods Processes Properties and Applications Excerpt :

Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes, structure and composition of the deposited films is critical to the continued evolution of these applications. This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. Its contents are spread in twelve main and concise chapters through which the book thoroughly reviews the bases of oxynitride thin film technology and deposition processes, sputtering processes and the resulting behaviors of these oxynitride thin films. More importantly, the solutions for the growth of oxynitride technology are given in detail with an emphasis on some particular compounds. This is a valuable resource for academic learners studying materials science and industrial coaters, who are concerned not only about fundamental aspects of oxynitride synthesis, but also by their innate material characteristics.